WebSAFETY DATA SHEET AZ nLOF 2024 Photoresist Substance No.: 000000501935 Version 4.1 Revision Date 04/03/2015 Print Date 11/13/2015 2 / 13 GHS-Labelling Symbol(s) : Signal word: Warning Hazard statements : Flammable liquid and vapour. Causes serious eye irritation. May cause respiratory irritation, and drowsiness or dizziness. WebSAFETY DATA SHEET AZ nLOF 2035 Photoresist Substance No.: 000000065924 Version 4.0 Revision Date 12/24/2014 Print Date 12/24/2014 2 / 14 Hazard category, Hazard class Specific target organ toxicity - single exposure, Category 3 GHS-Labelling Symbol(s) : Signal word : Warning Hazard statements : Flammable liquid and vapour. bounce electric scooter conversion kit WebSAFETY DATA SHEET AZ nLOF 2070 Photoresist Substance No.: GHSAP0071668 Version 5.1 Revision Date 04/03/2015 Print Date 11/13/2015 10 / 13 IATA UN number : 1993 Description of the goods : Flammable liquid, n.o.s. (2-Methoxy-1-methylethyl acetate) Class : 3 Packing group : III Labels : 3 ... WebMATERIAL SAFETY DATA SHEET AZ NLOF 2070 PHOTORESIST (US) Substance key: 000000071668 REVISION DATE: 08/24/2005 Version Print Date: 08/24/2005 1/8 Section 01 - Product Information Identification of the company: AZ Electronic Materials USA Corp. 70 Meister Avenue Somerville, NJ 08876 Telephone No.: 800-515-4164 bounce electric scooter corporate office http://pnf.uchicago.edu/process/detail/az-nlof-2070-photoresist/ WebAZ nLoF 2070 Photoresist (Gal) Typical Process Soft Bake: 110C (60s) Expose: i-line/broadband Post Expose Bake: 110C/60s Develop: spray or puddle Developer: AZ … 23. expansion of the ics modular organization is the responsibility of the WebAZ® nLOF 2035: for film thickness 3.5 µm @ 3000 rpm. AZ® nLOF 2070: for film thickness 7 µm @ 3000 rpm. UV-sensitivity: i-line (365 nm), NOT g- or h-line sensitive. Sales volumes: 100 ml, 250 ml, 500 ml, 1000 ml, 2,5 L and 3,78 L bottles. Beside the resist types above, MicroChemicals dilutes the AZ® nLOF to different thickness levels.

WebAZ nLoF 2035 (MIF) 365 AZ nLoF 2070 (MIF) 365: See Thick Resist Application Guide AZ nLoF 5510 (MIF) 365 ... WebAZ nLOF 2070 Photoresist Substance No.: 000000071668 Version 42 Revision Date 17.12.2012 Print Date 17.12.2012 1 / 13 ... 1.3 Details of the supplier of the safety data … bounce electric scooter for sale WebSAFETY DATA SHEET AZ nLOF 2070 Photoresist Substance No.: GHSAP0071668 Version 5.1 Revision Date 04/03/2015 Print Date 11/13/2015 2 / 13 GHS-Labelling Symbol(s) : Signal word: Warning Hazard statements : Flammable liquid and vapour. Causes serious eye irritation. May cause respiratory irritation, and drowsiness or dizziness. Web33 rows · Datasheet; AZ® 111 XFS Photoresist: AZ 111 XFS: General propose resists for wet etch applications with improved adhesion and reduced mask sticking: ... AZ nLOF … 23.exe feat.初音ミク yy 歌詞 WebThe nLOF 2070 Photoresist works well in both surfactant and non-surfactant containing tetramethylammonium hydroxide (TMAH) developers. AZ P4110 Photoresist The AZ P4110 Photoresist is a photoresist with improved adhesion to most common substrates and is used in wet etching and plating processes. WebAZ ® nLOF ™ 2000 Series i-line photoresists are engineered to ... Coat 7.0µm thick film AZ nLOF 2070 (330cPs) on bare Si Soft Bake 110C, 90s, direct contact hotplate Post Bake Delay None Expose i-line @ various doses(0.54NA) Nikon Stepper Post Expose Bake 110C, 90 seconds, direct contact hotplate Develop AZ 300MIF, 2 x 60 second puddles bounce electric scooter dealership WebAZ® nLOF 2035: for film thickness 3.5 µm @ 3000 rpm. AZ® nLOF 2070: for film thickness 7 µm @ 3000 rpm. UV-sensitivity: i-line (365 nm), NOT g- or h-line sensitive. Sales volumes: 100 ml, 250 ml, 500 ml, 1000 ml, 2,5 L and 3,78 L bottles. Beside the resist types above, …

WebMar 7, 2024 · AZ 9245, 9260: Intended for thick positive structures 4-20μm. Lower optical absorption and sensitivity permits tall structures but development is slow. (Product Page) … bounce electric scooter kit WebAZ® nLOF ™ 2000 Series i-Line Photoresists ... DATA SHEET Recommended Process Coat: 2.0 µm resist thickness Softbake: 110°C, 60 sec, contact Exposure: Nikon, 0.54 NA, 65 mJ/cm2 ... AZ® nLOF™ 2070 Photoresist 7.0 µm1.5 µm CD 180 mJ/cm2 Features High throughput • i-line dose to print < 100 mJ/cm2 23 expedition way corio